Wet etch methods for InAs nanowire patterning and self-aligned electrical contacts

Research output: Contribution to journalJournal articleResearchpeer-review

  • G. Fülöp
  • S. d'Hollosy
  • L. Hofstetter
  • A. Baumgartner
  • Nygård, Jesper
  • C. Schönenberger
  • S. Csonka
Original languageEnglish
Article number195303
JournalNanotechnology
Volume27
Issue number19
Number of pages8
ISSN0957-4484
DOIs
Publication statusPublished - 2016

Bibliographical note

[QDev]

    Research areas

  • indium arsenide, nanowire, patterning, lithography, wet etch, quantum dot, galvanic

ID: 161912451