High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching
Research output: Contribution to journal › Journal article › Research › peer-review
Original language | English |
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Journal | ACS Applied Nano Materials |
Volume | 1 |
Issue number | 6 |
Pages (from-to) | 2476-2482 |
ISSN | 2574-0970 |
DOIs | |
Publication status | Published - 1 Jun 2018 |
- atomic layer etching (ALE), nanoimprint lithography (NIL), nanopillar, nanofeatures, pattern transfer
Research areas
ID: 216156091