Periodic nano- Textured surfaces have been characterised using the new optical imaging scatterometry technique. A major benefit of imaging scatterometry compared to traditional scatterometry is that an area much smaller than the illuminated area can be analysed. That is, instead of averaging over the full illumination spot, scatterometry analysis can be made pixel by pixel. An area of interest much smaller than the spot size can therefore be characterized and the user first has to select the area of interest in the post-processing. Furthermore, a specific area on the sample can easily be found and areas with defects can be avoided. These advantages make imaging scatterometry a very effective and user-friendly characterization method and allow us to determine the homogeneity of a nano- Textured surface by performing pixel-wise analyses. In the analysis an inverse modelling approach is used, where measured diffraction efficiencies are compared to simulated diffraction efficiencies using a least-square fitting approach. We demonstrate an imaging scatterometry setup built into an optical microscope. The setup is capable of measuring multiple 2D gratings with pitches of 200 nm simultaneously. It is demonstrated that the imaging scatterometer can measure 2D nano- Textured surfaces with an accuracy of a few nm for the depth and width of the structures on areas down to 3 x 3 μm².